According to the ferrite crystal structure and morphology, the preparation process is broadly divided into: polycrystalline ferrite production process; ferrite chemical process; single crystal ferrite manufacturing process and other special processes, such as ferrite polycrystalline thin film and non Crystal ferrite and so on.

Polycrystalline ferrite production process

The sintering process commonly used in the ceramic industry includes the following steps: forming metal oxides or carbonates or other compounds of ferrite by solid-phase reaction, and after being uniformly mixed, are ball milled, dried and pressed into specific shapes. After calcination at a temperature of about 1000 ° C, it is thoroughly ground and mixed again. An appropriate amount of adhesive is added to the desired shape or extruded as a plastic into a tube, rod or strip. Then sintered at 1200 ~ 1400 ° C temperature, the exact temperature depends on the required ferrite properties. In the final sintering process, the environmental conditions in the hearth plays an important role.

Ferrite chemical process

Also known as wet process, sometimes referred to as chemical coprecipitation. Special preparation of high-performance ferrite process, but also can be divided into neutralization and oxidation. The process is as follows: the metal elements required for preparation of the ferrite are first prepared into a certain concentration of ionic solution, then the solution is mixed according to the formula, and the ferrite powder is formed through chemical reactions such as neutralization or oxidation, and thereafter The process is the same as described above.

Single crystal ferrite manufacturing process

And non-metallic single crystal growth is about the same. Mn-Zn and Ni-Zn ferrite single crystal growth is generally based on the Bretzmann method, polycrystalline ferrite is placed in a platinum crucible and melted, the crucible is lowered in an appropriate temperature gradient electric furnace from The bottom of the crucible slowly solidifies to form single crystals. In order to balance the partial pressure of oxygen formed in the molten state, it is necessary to add several or even 100 partial pressure of oxygen in the furnace during crystal growth.

Preparation of ferrite polycrystalline thin films

Such as perpendicular magnetized barium ferrite thin film, using a new type of target sputtering device sputtering. Preparation of garnet single crystal film, multi-use in the single-crystal substrate for vapor phase or liquid phase epitaxy, the specific process with the semiconductor single crystal thin film epitaxial method are very similar.

Preparation of amorphous ferrite

The current is the use of ultra-rapid cooling method and the sputtering method, the so-called ultra-rapid cooling method that is the ferrite material and the right amount of metalloid elements, the high-temperature melting state, the sudden implementation of large temperature gradient ultra-rapid cooling method. Research work in this area has just begun, the performance of products is not satisfactory.